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CN Develops DUV Lithography Machine Capable of Producing Chips of 8nm and Below
China's Ministry of Industry and Information Technology has issued the "Guiding Catalog for the Promotion and Application of the First (Set of) Major Technical Equipment (...
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CN Develops DUV Lithography Machine Capable of Producing Chips of 8nm and Below
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China's Ministry of Industry and Information Technology has issued the "Guiding Catalog for the Promotion and Application of the First (Set of) Major Technical Equipment (2024 Edition)", according to Chinese media reports.

The list of electronic special equipment includes deep ultraviolet (DUV) lithography equipment called "argon fluoride lithography machine," with core technical specifications of "300mm wafer diameter, 248nm illumination wavelength, resolution below 65nm, and alignment capability below 8nm," indicating that this Chinese-produced DUV lithography machine can manufacture chips of 8nm and below.

Previously, the US and the Netherlands tightened exports of lithography machines and other chip equipment to China. Reports suggest that if China can produce lithography machines capable of manufacturing chips of 8nm and below, it would mean that the vast majority of future chip manufacturing would no longer be controlled by ASML.

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